![Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering | SpringerLink Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1007%2Fs12043-018-1711-1/MediaObjects/12043_2018_1711_Fig1_HTML.png)
Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering | SpringerLink
![Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS): Journal of Applied Physics: Vol 121, No 17 Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS): Journal of Applied Physics: Vol 121, No 17](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.4978350&id=images/medium/1.4978350.figures.online.f1.jpg)
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS): Journal of Applied Physics: Vol 121, No 17
![Industrial-scale deposition of highly uniform and precise optical interference filters by the use of an improved cylindrical magnetron sputtering system - ScienceDirect Industrial-scale deposition of highly uniform and precise optical interference filters by the use of an improved cylindrical magnetron sputtering system - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S0257897215000857-gr1.jpg)
Industrial-scale deposition of highly uniform and precise optical interference filters by the use of an improved cylindrical magnetron sputtering system - ScienceDirect
![Tutorial: Hysteresis during the reactive magnetron sputtering process: Journal of Applied Physics: Vol 124, No 24 Tutorial: Hysteresis during the reactive magnetron sputtering process: Journal of Applied Physics: Vol 124, No 24](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.5042084&id=images/medium/1.5042084.figures.online.highlight_f1.jpg)
Tutorial: Hysteresis during the reactive magnetron sputtering process: Journal of Applied Physics: Vol 124, No 24
Reactive Cylindrical Magnetron Deposition ofReactive Cylindrical Magnetron Deposition ofReactive Cylindrical Magnetron Depositio
![Magnetron Sputtering Technology - ispc- heat U-factor. ... 10 / 89. Basics for magnetron sputtering. Ion-surface interaction ... Magnetron Sputtering Technology Magnetron Sputtering Technology - ispc- heat U-factor. ... 10 / 89. Basics for magnetron sputtering. Ion-surface interaction ... Magnetron Sputtering Technology](https://img.pdfslide.net/img/1200x630/reader019/reader/2020032909/5aa4a0457f8b9a1d728c1fd3/r-1.jpg?t=1623289237)